| The Canon MPA-600Super is a 1:1 mirror projection mask aligner,
which features improved overlay accuracy for mass production of VLSI devices. It’s development was
based on the MPA-600FA and MPA-500FAb. The new design achieves better yield, higher throughput and
improved stability. |
| Features |
| Auto Feeder: |
Single or double, cassette to cassette, backside wafer handling |
| |
| Wafer size: |
6”, 5” and 4” sizes available) |
| Mask size: |
7”, 6” and 5” sizes available) |
| |
| Illumination: |
2KW High Pressure Mercury Lamp
Intensity: > 600mW / cm2 (6 inch wafer)
Illumination Uniformity: + 3%
Aperture sizes: 0.7, 0.6, 0.5
Exposure Uniformity: + 3% |
| |
| Resolution: |
1.5um |
| Depth of Focus: |
> + 6um (linewidth 1.5um) |
| |
| Magnification: |
< 0.2um (PDC ON) |
| Distortion: |
3sigma < 0.5um (PDC OFF) |
| |
| Scanning Accuracy: |
< + 1.5% |
| |
| Auto Alignment Accuracy: |
LBS AA 3sigma < 0.58um (HeNe laser beam scan)
TV AA 3sigma < 0.43um (TV image processing) |
| |
| Throughput (6”wafer): |
> 89 wfs/h (first mask mode)
> 77 wfs/h (LBS AA mode)
> 68 wfs/h (TVAA mode) |
| |
Dimensions
 |
| |
| Required Facilities: |
|
| MPA-600FA: |
200 VAC, 3Phase, 6 kVA, 50/60Hz |
| Air Supply(CTC): |
200 VAC, 3Phase, 8 kVA, 50/60Hz |
| CDA(Clean Dry Air)Pressure: |
minimum 6.5 kg/cm2 , flow rate 130 lit/min |
| Vacum: |
50 cmHg or more |
| Exhaust Flow(for illuminator): |
6.5 m/sec to 9.5 m/sec (measured at illuminator output) |
