| Reticle: |
1.Size 6" square t=0.25"
2.Material Quartz
3.Pattern Material 2 layer Cr, 3 layer Cr
4.Pellicle Frame Pattern Side Only |
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| Wafer: |
1.Size 4” thru 8” SEMI Standard, JEIDA, Notch / Flat |
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| Projection Optics: |
1.Projection Magnification 1/5 X
2.Numerical Aperture .45 - .63
3.Field Size 22x22 17x26
4.Exposure Light Kr F(365nm) |
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| Illumination: |
1.Light Source 2.0KW Super High Pressure Hg Lamp
2.Intensity 8000 W/m2
3.Uniformity < 1.0%
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| Printing Performance: |
1.Resolution <0.35μm
2.Depth of Focus >1.0μm
3.Image Field Deviation <.3μm
4.Distortion <±0.035μm
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| Alignment: |
1.Reticle Rotation Accuracy <±0.01μm on wafer
2.Reticle Rotation Repeatability <0.02μm) on wafer
3.Wafer Alignment <0.04μm mean + 3sigma
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| Focus/Leveling: |
1.Focus Repeatability <0.10μm (3sigma)
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| Leveling: |
1.Leveling Repeatability <7ppm (3sigma)
2.Minimum Compensation Range >100ppm
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| Stage: |
1.Step Accuracy <0.03μm (3sigma)
2.Scaling <±0.5ppm
3.Orthogonality <±0.5ppm
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| Throughput: |
1.>102 wafers/hour Φ6", 22mm, 32 shots
2.>74 wafers/hour Φ8", 22mm, 60 shots
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