| Reticle: |
1.Size 6" square t=0.25"
2.Material Quartz
3.Pattern Material 2 layer Cr, 3 layer Cr
4.Pellicle Frame Pattern Side Only |
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| Wafer: |
1.Size 4” thru 8” SEMI Standard, JEIDA, Notch / Flat |
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| Projection Optics: |
1.Projection Magnification 1/5 X
2.Numerical Aperture .45 - .63
3.Field Size 22x22 22x26
4.Exposure Light Kr F(248nm) |
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| Illumination: |
1.Light Source KrF Cymer/ELS5300 / Output 10W
2.Energy 10mj / Pulse Frequency 1000Hz
3.Intensity 3500 W/m2
4.Uniformity < 1.2%
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| Printing Performance: |
1.Resolution <0.22μm
2.Depth of Focus >.80μm
3.Image Field Deviation <.25μm
4.Distortion <±0.03μm
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| Alignment: |
1.Reticle Rotation Accuracy <±0.01μm on wafer
2.Reticle Rotation Repeatability <0.02μm) on wafer
3.Wafer Alignment <0.045μm mean + 3sigma
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| Focus/Leveling: |
1.Focus Repeatability <0.10μm (3sigma)
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| Leveling: |
1.Leveling Repeatability <5ppm (3sigma)
2.Minimum Compensation Range >100ppm
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| Stage: |
1.Step Accuracy <0.02μm (3sigma)
2.Scaling <±0.3ppm
3.Orthogonality <±0.3ppm
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| Throughput: |
1.>120 wafers/hour Φ6", 22mm, 32 shots
2.>90 wafers/hour Φ8", 22mm, 60 shots
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