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EQUIPMENT SPECIFICATIONS

Canon Stepper MPA-600FA

1X  Mirror Projection
Auto Feeder: Single or double, cassette to cassette, backside wafer handling
 
Wafer Sizes: 4”, 5”, 6”
Mask Sizes: 5”, 6”, 7”
 
Resolution: 1.5 um  (using positive resist)
 
Illumination
2kw high pressure mercury lamp
 
Wavelengths used: 365nm(i-line)  405nm(h-line)  436nm(g-line)
Intensity: (@ 1800watts power output)   4”wafer-more than 700mw,    5”wafer-more than 650mw,   6”wafer-more than 600mw
Intensity / Exposure Uniformity: within +-3%
CTC
Constant Temperature Control – monitors and controls system temp. within +-.3 degrees C.
 
PDC
matic Distortion Control – provides fine distortion compensation
Automatic Alignment
HeNe (633nm)  Laser Beam Scanning
 
Alignment Modes: Spot Beam / Sheet Beam
Accuracy: 3sigma <=.54um
 
Required Facilities:  
 
MPA-600FA: 200 VAC, 3Phase, 6 kVA, 50/60Hz
Air Supply(CTC): 200 VAC, 3Phase, 8 kVA, 50/60Hz
CDA(Clean Dry Air)Pressure: minimum 6.5 kg/cm2  ,    flow rate  130 lit/min
Vacum: 50 cmHg or more
Exhaust Flow(for illuminator): 6.5 m/sec to 9.5 m/sec (measured at illuminator output)