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EQUIPMENT SPECIFICATIONS

Canon Stepper MPA-500FAb

1:1 Mirror Projection Aligner
Auto Feeder: Single, cassette to cassette, backside wafer handling
 
Wafer Size: 5”, 4” and 3”
Mask size: 6”, 5” and 4”
 
Illumination: 2KW High Pressure Mercury Lamp
Intensity: > 600mW / cm2 (6 inch wafer)
Illumination Uniformity: + 3%
Aperture sizes: 1.0, 1.1,
Exposure Uniformity: + 3%
 
Resolution: 1.5μm (positive resist)
Depth of Focus: >  + 6μm (line width 1.5μm)
 
Magnification: < 0.4μm (3sigma)
Distortion: 3sigma < 0.5um
 
Scanning Accuracy: < + 1.5%
 
Auto Alignment Accuracy: LBS AA 3sigma < 0.6um (HeNe laser beam scan)
 
Throughput (6”wafer): > 83 wfs/h (first mask mode)
> 72 wfs/h (LBS AA mode)