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EQUIPMENT SPECIFICATIONS

Canon Stepper FPA-3000 i4

Reticle: 1.Size 6" square t=0.25"
2.Material Quartz
3.Pattern Material 2 layer Cr, 3 layer Cr
4.Pellicle Frame Pattern Side Only
 
Wafer: 1.Size  4” thru 8” SEMI Standard, JEIDA,  Notch / Flat
 
Projection Optics: 1.Projection Magnification 1/5 X
2.Numerical Aperture  .45  -  .63
3.Field Size 22x22       17x26
4.Exposure Light   Kr F(365nm)
 
Illumination: 1.Light Source 2.0KW Super High Pressure Hg Lamp
2.Intensity  6500 W/m2
3.Uniformity < 1.0%
 
Printing Performance: 1.Resolution <0.35μm
2.Depth of Focus >.8μm
3.Image Field Deviation <.5μm
4.Distortion <±0.05μm
 
Alignment: 1.Reticle Rotation Accuracy <±0.01μm on wafer
2.Reticle Rotation Repeatability <0.02μm) on wafer
3.Wafer Alignment <0.06μm  mean + 3sigma
 
Focus/Leveling: 1.Focus Repeatability <0.10μm (3sigma)
 
Leveling: 1.Leveling Repeatability <7ppm (3sigma)
2.Minimum Compensation Range >100ppm
 
Stage: 1.Step Accuracy <0.04μm (3sigma)
2.Scaling <±0.5ppm
3.Orthogonality <±0.5ppm
 
Throughput: 1.>83 wafers/hour Φ6", 22mm, 32 shots
2.>59 wafers/hour Φ8", 22mm, 60 shots