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EQUIPMENT SPECIFICATIONS

Canon Stepper FPA-3000 EX3

Reticle: 1.Size 6" square t=0.25"
2.Material Quartz
3.Pattern Material 2 layer Cr, 3 layer Cr
4.Pellicle Frame Pattern Side Only
 
Wafer: 1.Size  4” thru 8” SEMI Standard, JEIDA,  Notch / Flat
 
Projection Optics: 1.Projection Magnification 1/5 X
2.Numerical Aperture  .40  -  .60
3.Field Size 22x22       22x26
4.Exposure Light   Kr F(248nm)
 
Illumination: 1.Light Source KrF  Cymer/ELS4300 / Output 7.2W
2.Energy 12mj / Pulse Frequency 600Hz
3.Intensity  2000 W/m2
4.Uniformity < 1.2%
 
Printing Performance: 1.Resolution <0.25μm
2.Depth of Focus >.70μm
3.Image Field Deviation <.35μm
4.Distortion <±0.045μm
 
Alignment: 1.Reticle Rotation Accuracy <±0.01μm on wafer
2.Reticle Rotation Repeatability <0.02μm) on wafer
3.Wafer Alignment <0.055μm  mean + 3sigma
 
Focus/Leveling: 1.Focus Repeatability <0.10μm (3sigma)
 
Leveling: 1.Leveling Repeatability <7ppm (3sigma)
2.Minimum Compensation Range >100ppm
 
Stage: 1.Step Accuracy <0.04μm (3sigma)
2.Scaling <±0.5ppm
3.Orthogonality <±0.5ppm
 
Throughput: 1.>73 wafers/hour Φ6", 22mm, 32 shots
2.>53 wafers/hour Φ8", 22mm, 60 shots